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Optical Communication Semiconductor Silica Sand Processing Plant and Production Line
The Optical Communication Semiconductor Silica Sand Processing Plant is a total solution designed to meet the demand for ultra-high purity quartz sand in the optical communication and semiconductor industries. The system specializes in the production of ultra-high purity silica sand with a purity of 5N-6N (99.999%-99.9999%) and a key impurity content of less than 1ppm through cutting-edge processes such as precision crushing, multi-stage purification, high-temperature treatment, and ultra-fine grading, and is suitable for use in fiber optic pre-fabricated rods, semiconductor quartz crucibles, wafer carriers, and other high-end manufacturing fields.
Raw Material Precision Pretreatment Section
High-grade quartz ore is precisely sorted by color sorter and laser sorting equipment to eliminate impurity-containing grains; subsequently, the raw material is processed to a particle size of less than 10mm through the multi-stage crushing of jaw crusher and cone crusher, and ideal conditions are created for the subsequent dissociation and purification.
Thermal activation and deep dissociation section
The crushed material is heat-treated in a 1200°C high-temperature calciner, which induces the generation of internal microcracks and optimizes the degree of mineral dissociation through the water quenching process; this process significantly improves the reaction efficiency and homogeneity of the subsequent chemical purification.
Multi-mode in-depth decontamination section
High-voltage electrowinning separation: utilizing 20kV high-voltage electric field to accurately separate symbiotic minerals based on conductivity differences.
Superconducting magnetic separation and purification: using more than 5T superconducting magnetic separator to remove iron, chromium, nickel and other paramagnetic impurities in depth.
Flotation refining: using customized capture agent in acidic medium to effectively separate feldspar, mica and other aluminosilicate minerals.
Chemical Deep Purification System
The materials are leached in a closed high purity reactor for 48 hours at 85°C with mixed acid to completely dissolve surface inclusions and lattice channel impurities; a fully automatic cleaning system is used to complete the twelve-stage countercurrent rinsing to ensure that the residual amount of acid radical ions is less than 0.1ppm.
High temperature chlorination purification process
High-purity chlorine gas is introduced under a specific atmosphere at 1250°C to make alkali metals, transition metals and other stubborn impurities generate gaseous chlorides to be volatilized and removed, and the removal rate of this process for uranium, thorium and other radioactive elements can reach more than 99.9%.
Ultra-fine grading and finished product processing
The multi-stage airflow classifier realizes the precise control of 0.5-45μm particle size, and is equipped with on-line laser particle sizer to monitor the particle size distribution in real time; the finished products are vacuum-packed in a clean environment of 1,000 levels, which ensures zero contamination during transportation and storage.
Ultimate purity guarantee system
Integrating the three core technologies of physical sorting, chemical deep purification and high-temperature chlorination to build a complete purification chain, ensuring that the purity of the products reaches the 5N-6N standard stably, and the content of key metal impurities is controlled within the range of 0.1-1ppm.
Precise particle size control technology
Adopting multi-stage classification process combining airflow classification and centrifugal classification, the product particle size distribution concentration D90/D10≤1.8, meeting the extreme requirements for powder consistency in the field of optical communications and semiconductors.
Clean production in the whole process
The core process is completed in a thousand-level clean environment, and the equipment is made of high-purity quartz, PTFE and other inert materials to fully eliminate the risk of secondary pollution in the production process.
Intelligent quality traceability
Introducing MES production execution system, the whole process of tracing raw materials, process parameters, quality data, and establishing a perfect quality file, to ensure that each batch of products can be traced back to the original production data.
Clean production area planning
Raw material pretreatment area adopts class 10,000 clean standard, chemical purification and finished product processing area carries out class 1,000 clean specification, and each area realizes cleanness grading control through air shower room and material transfer window.
Professional equipment configuration program
Crushing section: equipped with ceramic liner crushing equipment to avoid metal pollution.
High-temperature treatment: adopting silicon molybdenum rod electric kiln, temperature control precision ±2°C.
Classification system: equipped with high-precision turbine classifier, classification efficiency ≥85%.
Testing center: equipped with high-precision analytical instruments such as ICP-MS, GD-MS, etc.
Environmental protection and safety system
Acidic waste gas is discharged to the standard after three-stage absorption treatment, and chlorination tail gas is harmlessly treated through a special treatment system; an emergency treatment device is set up to comprehensively guarantee the safety of chemical use.
Through the perfect combination of extreme purification process and clean production system, this solution provides ultra-high purity silica sand products with stable quality and excellent performance for the optical communication and semiconductor industries, and assists the development of 5G communication, integrated circuits and other strategic emerging industries.



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